[5] T.S.J. Lammerink, F. Dijkstra, Z. Houkes, and J. van Kuijk, Intelligent gas- mixture flow sensor, Sensors and Actuators A, 46/47, 380-384, 1995.

[1] OMEGA, Volume 4 - Flow and Level Measurement, Table 1, Transactions in Measurement and Control, OMEGA Press

[2] J. G. Webster, Electronics - Measurement, Instrumentation and Sensors Handbook, cap. 28, CRC Press, 1999.

[3] M. Elwenspoek, R. Wiegerink, Mechanical Microsensors, first ed., Springer- Verlag, Berlin, 2001.

[4] P. Bradshaw, Thermal methods of flow measurement, J. Phys. E: Sci. Instrum.,1 (1968) 504-509.

[5] T.S.J. Lammerink, F. Dijkstra, Z. Houkes, and J. van Kuijk, Intelligent gas- mixture flow sensor, Sensors and Actuators A, 46/47, 380-384, 1995.

[6] T.S.J. Lammerink, N.R. Tas, M. Elwenspoek and J.H.J. Fluitman, Micro-liquid flow sensor, Sensors and Actuators A, 37/38, 45-50, 1993.

[7] van Putten, A.F.P., and Middelhoek, Integrated Silicon Anemometer, IEE Electronics Letters, Vol. 10, 1974, pp. 425-426.

[8] van Riet, R.W.M., and J.H. Huysing, Integrated Direction-Sensitive Flow-Meter, IEE Electronics Letters, Vol. 12, 1976, pp. 647-648.

[9] A.W. van Herwaarden, D.C. van Duyn, B.W. van Oudheusden, P.M. Sar- ro, Integrated Thermopile Sensors, Sensors and Actuators, A21-A23, 1989, 621-630.

[10] R. Lenggenhager, CMOS thermoelectric infrared sensors, Tesi di dottorato in scienze naturali, Svizzera, 1960.

150

[11] T.S.J. Lammerink, N.R. Tas, G.J.M. Kijnen and M. Elwenspoek, A New Class of Thermal Flow Sensors Using ∆T=0 as a Control Signal, Proc. International Conference on Micro Electro Mechanical Systems (MEMS), Miyazaki, Japan, 2000, pp. 525-530.

[12] G. Stemme, A Monolithic Gas Flow Sensor with Polymide as Thermal Insulator, IEEE Trans. on Electron Devices, Vol. 33, No. 10, 1986, pp. 1470-1474.

[13] S. Wu, et al., MEMS Flow Sensors for Nano-Fluid Applications, Sensors and Actuators, Vol. A89, 2001, pp. 152-158.

[14] T. Ebefors, E. K¨ alvesten, and G. Stemme, Three Dimensional Silicon Triple- Hot-Wire Anemometer Based on Polymide Joints, Proc. International Confe- rence on Micro Electro Mechanical Systems (MEMS), Heidelberg, Germany, 1998, pp. 93-98.

[15] J. Chen, et al., Two-Dimensional Micromachined Flow Sensor Array for Fluid Mechanics Studies, Journal of Aerospace Engineering, Vol. 16, No. 2, 2003, pp.

85-97.

[16] F. Mayer, O. Paul and H. Baltes, Influence of Design Geometry and Packaging of the Response of Thermal CMOS Flow Sensors, The 8th International Con- ference on Solid-State Sensors and Actuators, and Eurosensors IX, Stockholm, Sweden, June 25-29, 1995.

[17] Seiji Oda, Mitsuyoshi Anzai, Shoichi Uematsu, and Kenzo Watanabe, A Silicon Micromachined Flow Sensor Using Thermopiles for Heat Transfer Measure- ments, IEEE Transactions on Instrumentation an Measurement, Vol. 52, No. 4, August 2003.

[18] N. Sabat´ e, J. Santander, L. Fonseca, I. Gr` acia, C. Can´ e, Multi-range silicon micromachined flow sensor, Sensors and Actuators A 110, 2004, 282-288.

[19] Grigoris Kaltas, Athanase A. Nassiopoulos, and Androula G. Nassiopoulou,

Characterization of a Silicono Thermal Gas-Flow Sensor With Porous Silicon

Thermal Isolation, IEEE Sensors Journal, Vol. 2, No. 5, October 2002.

[20] K.A.A. Makinwa, and J.H. Huijsing, A Smart Wind Sensor Using Thermal Sigma-Delta Modulation Techniques, Sensors and Actuators, Vol. A97-98, 2002, pp. 15-20.

[21] M. Ashauer et al., Thermal Flow Sensor for Liquids and Gases Based on Combinations of Two Principles, Sensors and Actuators, Vol. A73, 1999, pp.7-13.

[22] Ellis Meng and Yu-Chong Tai, A parylene MEMS Flow Sensing Array, De- partement of Electrical Engineering, Caltech Micromachining Lab California Institute of Technology.

[23] S.T. Cho, and K.D. Wise, A High Performance Microflowmeter with Built-In Self Test, Proc. Transducers, San Francisco, CA, 1991, pp. 400-403.

[24] R.E. Oosterbroek, et al., A Micromachined Pressure/Flow Sensor, Sensors and Actuators, Vol. A77, 1999, pp. 167-177.

[25] P. Enoksson, G. Stemme, and E. Stemme, A Silicon Resonant Sensor Struc- ture for Coriolis Mass-Flow Measurements, Journal of Microelectromechanical System, Vol. 6, No. 2, 1997, pp. 119-125.

[26] D. Sparks, et al., A Portable MEMS Coriolis Mass Flow Sensor, IEEE Sensors Conference, 2003, Toronto, Canada, No. 8.4 p.90, Oct. 2003.

[27] Hans-Elias de Bree, An overview of Microflown

Technologies,www.microflown.com.

[28] Dong-Hui Gao, Ming Qin, Hai-Yang Chen, Qing-An Huang, A Self-packaged Thermal Flow Sensor by CMOS MEMS Technology.

[29] Tesi di laurea di Carmine Iannella, Progetto di un sensore di portata per gas con interfaccia di lettura integrata, Universit` a degli studi di Pisa, Facolt` a di Ingegneria, Corso di Laurea in Ingnegneria Elettronica, AA. 2003/2004.

[30] Tesi di laurea di Alessio Ciomei, Progetto e dimensionamento di sensori in- tegrati di portata mediante simulazioni FEM, Universit` a degli studi di Pi- sa, Facolt` a di Ingegneria, Corso di Laurea in Ingegneria Elettronica, AA.

2004/2005.

[31] Marc J. Madou, Fundamentals of Microfabrication, CRC Press, 2002, cap. 1.

[32] Tesi di laurea di Stefano Stanzione, Progetto e simulazione di anemometri ba- sati su sistemi micro-elettro-meccanici, Universit` a degli studi di Pisa, Facolt` a di Ingegneria, Corso di Laurea in Ingegneria Elettronica, AA. 2005/2006.

[33] Jian-Bo Sun, Ming Qin, Qing-An Huang, A Flip-Chip Packaged CMOS Thermal Flow Sensor, 2005.

[34] I. Filippi, Progetto di un interfaccia per termopile integrate in tecnologia BCD.

Tesi di laurea in ingegneria elettronica, Pisa 2003.

[35] B.W. van Oudheusden, The determination of the effective ambient tempera- ture for thermal flow sensors in a non-isothermal environment, Sensors and Actuators, Vol. 72, 1999, pp. 38–45.

[36] K. E. Petersen, Silicon as a mechanical material, Proc. IEEE, Vol. 70, 1982, pp.

420-457.

[37] G. T. A. Kovacs, N. I. Maluf, K. E. Petersen, Bulk Micromachining of Silicon, Proc. IEEE, Vol. 86, 1998, pp. 1536-1551.

[38] H. Seidel, The mecanism of anisotropic silicon etching and its relevance for micromachining, Proc. Transducers ’87, Rec. 4th Int. Conf. Solid-State Sensors and Actuators, Tokyo, Japan, 1987, pp. 120-125.

[39] H. Seidel, L. Csepregi, A. Heuberger, and H. Baumg¨ artel, Anisotropic etching of crystalline silicon in alkaline solutions I: Orientation dependence and beha- viour of passivation layers, J. Electrochem. Soc., Vol. 137, no. 11, pp. 3612-3626, 1990.

[40] J. B: Price, Anisotropic etching of silicon with K OH − H

O-isopropyl alcohol, Semiconductor Silicon, 1973, p. 339.

[41] D. Moser, CMOS flow sensors, Doctoral dissertation, Swiss Federal Institute of Technology, Zurich, Swutzerland, 1993.

[42] F. I. Chang, R. Yeh, G. Lin, P. B. Chu, E. Hoffman, E. J. Kruglick, K. S. J. Pister,

and M. H. Hecht, Gas-phase silicon micromachining with xenon difluoride,

Proc. SPIE Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications, Austin, TX, July 1995, Vol. 2641, pp. 117-128.

[43] S. Beeby, G. Ensell, M. Kraft, N. White, MEMS Mechanical Sensors, Artech House, 2004, cap. 2.

[44] G. C. Schwartz and P. M. Schaible, Reactive ion etching of silicon, J. Vac. Sci.

Technol., Vol. 16, no. 2 , pp. 410-413, 1979.

[45] G. Mulhern, D. Soane, and R. Howe, Supercritical Ca rbon Dioxide Drying of Microstructures, Transducers ’93, Yokahama, Japan, 1993, pp. 296-298.

[46] O. Tabata, R. Asahi, H. Funabashi, K. Shimaoka, and S. Sugiyama, Anisotropic etching of silicon in TMAH solutions, Sensors Actuators A, Vol. 34, no. 1, pp.

51-57, 1992.

[47] G. Yan, P. C. H. Chan, et al., An improved TMAH Si-etching solution without attacking exposed aluminum, Sensors and Actuators, Vol. A89, 2001, pp. 135- 141.

[48] P. M. Sarro, S. Brida, C. M. A. Ashruf, et al., Anisotropic Etching of Silicon in Saturated TMAHW Solutions for IC-Compatible Micromachining.

[49] A. Merlos, M. Acero, M. H. Bao, J. Bausells, and J. Esteve, TMAH/IPA anisotro- pic etching characteristics, Sensors and Actuators, Vol. A37-A38, pp. 737-743, 1993.

[50] M. Shikida, T. Masuda, D. Uchikawa, K. Sato, Surface roughness of single- crystal silicon etched by TMAH solution, Sensors and Actuators, Vol. A90, 2001, pp. 223-231.

[51] R. J. Reay, E. H. Klaassen, and G. T. A. Kovacs, Thermally and electrically isolated single-crystal silicon structures in CMOS technology, IEEE Electron Device Lett., Vol. 15, pp. 399-401, 1994.

[52] N. Maluf, K. Williams, An Introduction to Microelectromechanical Sistems

Engineering, Artech House, 2004.

[53] M. Wang, P.Catalano and Gianluca Iaccarino, Prediction of high Reynolds number flow over a circular cylinder using LES with wall modeling.

[54] M. Zhao, L. Cheng, B. Teng, D. Liang, Numerical simulation of viscous flow past

two circular cylinders of different diameters, Applied Ocean Research, Vol. 27,

2005, pp. 39-55.