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UNIVERSITÀ’+DEGLI+STUDI+DI+TRIESTE+

+++++ XXV +++ CICLO+DEL+DOTTORATO+DI+RICERCA+IN+

+ + +

NANOTECNOLOGIE+

+

+

+ +

MBE+growth+of+self?assisted+GaAs+nanowires+

and+

their+characterization+

+ + + +

Settore+scientifico?disciplinare:+ 02/B1+

++

+ +

DOTTORANDO+/+A+

+

STEFANO+F.+AMBROSINI+

+

+ +

COORDINATORE+

+

PROF.+MAURIZIO+FERMEGLIA+

+

+ +

SUPERVISORE+DI+TESI+

+

DR.+SILVIA+RUBINI+

+

+

+

ANNO+ACCADEMICO+2011+/+2012+

(2)

+ +

(3)

+ + + + + + + + + + + +

Veni, Vidi, Vici +

Caius+Iulius+

De+bello+Gallico+ +

(4)

Abstract((ita)(

La+ricerca+nel+campo+dei+nanofili+appartiene+ancora+al+laboratorio+e+non+all’industria.+

Cionondimeno,+i+nanofili+sono+oggetto+di+grande+attrazione+nella+comunità+scientifica+

e+ nanotecnologica,+ sia+ per+ il+ loro+ elevato+ “aspect+ ratio”,+ che+ per+ le+ loro+ capacità+

semiconduttrici.+Il+primo+ne+fa+buoni+candidati+per+usi+di+sensoristica+e+interazione+

con+ la+ luce,+ le+ seconde+ potrebbero+ invece+ sfruttate+ per+ la+ miniaturizzazione+ di+

componenti+(opto)elettronici.+

Il+ GaAs+ è+ un+ materiale+ semiconduttore+ III?V+ con+ un+ band?gap+ diretto+ di+ 1,43+ eV+ a+

temperatura+ ambiente.+ Il+ suo+ band+ gap+ ne+ fa+ un+ materiale+ più+ pregiato+ del+ silicio,+

rispetto+ al+ quale+ ha+ una+ minore+ sensibilità+ al+ calore+ ed+ una+ maggiore+ mobilità+

elettronica.+ Tali+ pregi+ sono+ accompagnati+ da+ un+ prezzo+ maggiore,+ che+ oggigiorno+

limita+ l’uso+ del+ GaAs+ nei+ componenti+ optoelettronici+ a+ più+ alta+ qualità,+ come+ per+

esempio+ negli+ usi+ satellitari.+ La+ sintesi+ di+ nanofili+ di+ GaAs+ di+ alta+ qualità+ è+ una+

possibiità+intrigante+per+combinare+le+qualità+superiori+del+GaAs+con+il+minor+costo+

del+silicio+e+della+sua+tecnologia.+

L’epitassia+ da+ fascio+ molecolare+ è+ una+ tecnica+ per+ sintetizzare+ materiali+ con+ la+

massima+ purezza.+ Operando+ a+ pressioni+ minori+ di+ 1E

?10

+ Torr,+ essa+ è+ ideale+ per+ la+

ricerca+ scientifica+ e+ per+ la+ sintesi+ di+ prodotti+ di+ altissima+ qualità.+ I+ prezzi+ di+ tali+

caratteristiche+sono+un’estrema+delicatezza+dell’apparato+ed+un+controllo+maniacale+

delle+condizioni+di+crescita+per+assicurare+riproducibilità+dei+risultati.++

All’inizio+ del+ 2009,+ la+ comunità+ di+ crescitori+ di+ nanofili+ era+ alle+ prese+ con+ alcune+

problematiche+riguardanti+la+scelta+di+un+materiale+diverso+dall’oro+per+assistere+la+

crescita+ e+ conseguentemente+ di+ un+ substrato+ acconcio;+ ulteriori+ complicazioni+ alla+

sintesi+ di+ nanofili+ di+ alta+ qualità+ è(ra)+ il+ politipismo+ cristallino+ dei+ nanofili+ di+ GaAs.+

L’uso+di+oro+nella+sintesi+di+nanofili+comporta+inquinamento+chimico+responsabile+di+

difetti+nel+materiale+e+la+presenza+di+nanoparticelle+di+oro+all’estremità+dei+nanofili+li+

(5)

nanofili+di+GaAs+su+GaAs+e+i+difetti+cristallini+erano+una+piaga+presso+che+impossibile+

da+eliminare.+

La+mia+tesi+di+dottorato+è+stata+votata+allo+studio+di+queste+due+problematiche.+

Abbiamo+ studiato+ un+ protocollo+ semplice+ per+ la+ realizzazione+ di+ substrati+ di+ GaAs+

capaci+di+ospitare+la+crescita+di+nanofili+di+GaAs+in+assenza+di+Au,+depositando+uno+

strato+ subnanometrico+ di+ silicio+ su+ substrati+ deossidati+ di+ GaAs+ ed+ espondendoli+

quindi+ all’aria.+ Più+ semplice+ ancora,+ la+ deposizione+ di+ Si+ direttamente+ su+ substrati+

GaAs+epiready+si+è+dimostrata+altrettanto+efficace.+

Abbiamo+ affrontato+ il+ problema+ del+ politipismo+ cristallino+ sia+ durante+ la+ crescita,+

investigando+le+relazioni+tra+parametri+di+crescita+e+struttura+cristallina+dei+nanofili,+

sia+dopo+la+crescita,+cercando+di+alterarla+tramite+riscaldamento.+

Abbiamo+così+scoperto+che+condizioni+ricche+in+As+durante+la+crescita+assistita+da+Ga+

favoriscono+ la+ struttura+ cristallina+ wurtzite,+ al+ contrario+ della+ più+ stabile+ struttura+

zincoblenda,+propria+del+GaAs+di+bulk.+Il+protrarsi+di+condizioni+ricche+in+As+portano+

quindi+alla+estinzione+della+nanoparticella+di+Ga.+

In+collaborazione+con+dr.+Jakob+B.+Wagner+(DTU+CEN,+Copenaghen,+Danimarca),+dott.+

mag.+ Damiano+ Cassese+ ed+ il+ gruppo+ di+ ricerca+ di+ dr.+ Marco+ Lazzarino+ (IOM+ CNR,+

Trieste,+ Italia)+ abbiamo+ scoperto+ che+ un+ periodo+ di+ riscaldamento+ di+ cento+ ore+ in+

flusso+ di+ As+ è+ capace+ di+ alterare+ la+ struttura+ wurtzite+ di+ nanofili+ assistiti+ Au+ in+

zincoblenda.+Tale+scoperta+è+stata+in+principio+fatta+tramite+microscopia+elettronica+

in+trasmissione+e+quindi+confermata+per+mezzo+di+spettroscopia+Raman.+

Abbiamo+ studiato+ la+ crescita+ di+ nanofili+ di+ GaAs+ in+ assenza+ di+ nanoparticella.+ In+

collaborazione+ con+ dott.+ mag.+ Giacomo+ Priante+ (IOM+ CNR,+ Trieste,+ Italia)+ e+ prof.+

Vladimir+G.+Dubrovskii+(SPBAU,+San+Pietroburgo,+Russia)+abbiamo+trovato+che+anche+

dopo+la+totale+consunzione+della+nanoparticella+di+Ga,+i+nanofili+possono+riprendere+

la+crescita+in+modo+assistito+da+Ga.++

Altri+studi+di+minore+entità+sono+stati+condotti,+come+la+crescita+di+nanofili+di+Si+su+

GaAs+senza+catalizzatore,+lo+studio+di+nanotubi+in+carbonio+contenenti+nanoparticelle+

(6)

di+ catalizzatore,+ lo+ studio+ di+ microscopia+ elettronica+ in+ trasmissione+ della+ crescita+

laterale+ dei+ nanofili,+ l’effetto+ di+ “optical+ limiting”+ esercitato+ da+ sistemi+ ibridi.+ I+

risultati+di+questi+studi,+stonando+nella+logica+della+tesi,+sono+presentati+in+appendice.+

Altresì,+in+appendice+è+raccolta+una+sistematica+della+crescita+di+nanofili+di+GaAs.+

Durante+i+beam+times+ad+ELETTRA,+il+Sincrotrone+di+Basovizza,+Trieste,+il+mio+lavoro+è+

stato+principalmente+votato+alla+sintesi+di+nanofili+di+GaAs+drogati+Si+sui+substrati+di+

cui+ sopra.+ I+ nanofili+ sono+ stati+ studiati+ con+ spettroscopia+ a+ raggi+ X+ risolta+

spazialmente+sulla+linea+di+luce+ESCAMICROSCOPY,+in+collaborazione+con+dr.+Mattia+

Fanetti+e+lo+staff+della+linea+di+luce.+

La+prima+sessione+di+esperimenti+ha+mostrato+che+i+nanofili+assisiti+da+Ga+sono+meno+

conduttivi+degli+assistiti+da+Au+per+lo+stesso+drogaggio+nominale.+La+seconda+tranche+

di+ esperimenti+ ha+ permesso+ la+ comprensione+ del+ meccanismo+ di+ incorporazione+

delle+impurezze+di+Si+durante+la+crescita+mediante+lo+studio+della+posizione+del+livello+

di+ Fermi+ nella+ band+ gap+ dei+ nanofili+ di+ GaAs.+ Abbiamo+ così+ capito+ che+ alterando+ il+

rapporto+ As/Ga+ e+ senza+ cambiare+ la+ temperatura+ di+ crescita+ (andando+ cioè+ a+

crescere+in+assenza+di+nanoparticella)+è+possibile+realizzare+eterogiunzioni+radiali+p?n+

di+alta+qualità,+con+la+stessa+quantità+di+drogante.+

Questa+ tesi+ di+ dottorato+ è+ organizzata+ come+ segue:+ ad+ ogni+ argomento+ principale+

(substrato,+politipismo,+ripresa+della+crescita,+spettroscopia+con+luce+di+sincrotrone)+è+

dedicata+un+capitolo.+In+ogni+capitolo,+l’introduzione+spiega+l’interesse+del+particolare+

argomento,+ lo+ stato+ dell’arte+ e+ la+ nostra+ soluzione+ ai+ problemi+ aperti.+ Seguono+ i+

nostri+risultati+con+discussione+ed+infine+le+conclusioni.+

Buona+lettura.+

+

( (

(7)

Abstract((eng)(

Although+still+belonging+to+the+laboratory+world,+nanowires+are+the+object+of+a+big+

attraction+in+scientific+community+for+their+exploitation+in+technological+devices.+Two+

of+the+most+alluring+aspects+of+nanowires+are+their+high+aspect+ratio,+which+makes+

them+ candidates+ for+ sensing+ uses+ as+ well+ as+ light+ harvesting,+ and+ their+

semiconducting+ nature,+ that+ puts+ forward+ their+ employment+ for+ nanoscale+

transistors+and+logic+units.++

GaAs+is+a+well?known+III?V+semiconductor+material+with+a+direct+band?gap+of+1.43+eV+

at+room+temperature.+It+has+better+properties+than+Si,+such+as+a+large+direct+band?

gap,+which+also+provides+lower+sensibility+to+heating,+and+higher+electron+mobility.+

Despite+its+higher+cost,+GaAs+is+nowadays+commonly+used+for+highest+performance+

logic+ units+ and+ optoelectronics.+ The+ synthesis+ of+ high+ quality+ GaAs+ nanowires+ and+

their+implementation+on+Si+technology+encourages+the+idea+of+putting+together+the+

superior+GaAs+with+the+cheaper+Si.+

Molecular+beam+epitaxy+is+a+growth+technique+that+offers+the+highest+possible+purity+

by+ means+ of+ ultra+ high+ vacuum+ growth+ regime+ (base+ pressure+ <+ 1E

?10

+ Torr).+ It+ is,+

therefore,+ ideal+ for+ both+ research+ and+ high+ quality+ products.+ Prices+ of+ such+

advantages+are+an+extreme+delicateness+of+the+setup+and+a+maniacal+control+of+the+

growth+conditions,+to+ensure+reproducibility+in+scientific+results.++

At+the+beginning+of+2009,+the+nanowire+grower+community+was+facing+some+issues+

such+as+the+choice+of+a+material+different+from+gold+assisting+the+nanowire+growth,+

the+ growth+ substrate+ and+ the+ crystal+ polytypism.+ The+ use+ of+ Au+ as+ the+ assistant+

nanowire+ growth+ material+ had+ two+ main+ drawbacks.+ Firstly,+ the+ verified+ pollution+

with+ Au+ of+ the+ growing+ nanowires+ would+ create+ defects+ in+ the+ material;+ secondly,+

the+presence+of+Au+nanoparticles+at+the+nanowire+free+end+would+make+them+non?

compatible+ with+ Si?based+ technology.+ Focusing+ on+ GaAs,+ there+ was+ no+ simple+

protocol+for+the+substrate+treatment+in+order+to+trigger+the+Au?free+one?dimensional+

nanowire+growth+on+GaAs.+Nanostructure+crystal+defects+were+almost+impossible+to+

avoid.++

(8)

My+Ph.D.+work+has+been+devoted+to+the+study+of+these+problems.++

We+studied+a+simple+protocol+to+obtain+GaAs+nanowires+on+GaAs+by+MBE.+We+proved+

that+a+sub?nanometric+Si+layer+epitaxially+deposited+on+the+deoxidized+GaAs+surface+

followed+ by+ atmospheric+ oxidation,+ or+ direct+ Si+ deposition+ onto+ epiready+ GaAs+

wafers+is+able+to+trigger+Ga+assisted+GaAs+nanowire+growth.+

We+ tackled+ the+ nanowire+ polytypism+ issue+ both+ in+ a+ “during+ growth”+ action,+ by+

studying+the+effects+of+the+growth+parameters+on+the+nanowire+crystal+structure;+and+

with+ an+ “after+ growth”+ action,+ by+ attempting+ to+ change+ the+ nanowire+ crystal+

structure+by+thermal+annealing+after+the+growth+itself.+

In+ particular+ we+ found+ that+ As+ rich+ conditions+ during+ Ga+ assisted+ GaAs+ nanowire+

growth+leads+to+a+favored+wurtzite+structure+as+compared+to+the+default+zincblende+

lattice+of+the+bulk+GaAs+material.+Eventually,+As+rich+conditions+lead+to+the+total+Ga+

nanoparticle+consumption.+

In+ collaboration+ with+ dr+ Jakob+ B.+ Wagner+ (DTU+ CEN,+ Copenhagen,+ Denmark),+ dott.+

mag.+ Damiano+ Cassese+ and+ the+ research+ group+ of+ dr.+ Marco+ Lazzarino+ (IOM+ CNR,+

Trieste,+Italy),+we+discovered+that+a+100+hours+long+nanowire+annealing+step+under+

As+ flux+ is+ capable+ of+ transforming+ the+ wurtzite+ structure+ of+ Au+ assisted+ GaAs+

nanowires+ in+ zincblende.+ This+ was+ carried+ out+ by+ means+ of+ transmission+ electron+

microscopy+and+was+double+checked+by+means+of+Raman+spectroscopy.++

We+studied+the+growth+of+GaAs+nanowires+in+absence+of+growth+assisting+droplet.+In+

collaboration+with+dott.+Giacomo+Priante+(IOM+CNR,+Trieste,+Italy)+and+prof.+Vladimir+

G.+ Dubrovskii+ (SPBAU,+ Saint+ Petersburg,+ Russia),+ we+ found+ that+ after+ the+ total+

consumption+ of+ the+ Ga+ nanoparticle,+ GaAs+ nanowires+ can+ resume+ the+ Ga+ assisted+

growth.+

Other+ minor+ projects+ such+ as,+ the+ MBE+ growth+ of+ self+ catalyzed+ Si+ nanowires+ on+

(9)

When+being+assigned+beam+time+at+the+ELETTRA+Synchrotron+facility+in+Trieste,+my+

work+ has+ mainly+ been+ the+ synthesis+ of+ Si?doped+ GaAs+ NWs+ on+ our+ innovative+

substrates.+Nanowires+were+then+studied+in+spatially+resolved+X?ray+photoemission+

spectroscopy+ experiments+ on+ the+ ESCAMICROSCOPY+ beamline,+ performed+ in+

collaboration+with+dr.+Mattia+Fanetti+and+the+ESCAMICROSCOPY+staff.++

The+ first+ measurement+ set+ showed+ that+ Ga+ assisted+ nanowires+ exhibit+ a+ much+

weaker+ conductivity+ than+ their+ Au+ catalyzed+ counterparts,+ for+ the+ same+ two?

dimensional+nominal+doping.+The+second+set+of+experiments+gave+details+about+the+

incorporation+ of+ Si+ in+ nanowires+ during+ the+ growth,+ by+ the+ detection+ of+ the+ Fermi+

level+in+the+energy+gap.+We+realised+that+by+tuning+the+As/Ga+flux+ratio+without+need+

of+changing+the+growth+temperature++(i.e.,+shifting+from+vapor?liquid?solid+to+vapor?

solid+ regime)+ and+ for+ the+ same+ impurity+ flux,+ core?shell+ p?n+ junctions+ could+ be+

synthesized,+with+a+high+uniformity+grade+along+the+whole+nanowire+length.+

This+ Ph.D.+ thesis+ is+ organized+ as+ follows:+ to+ each+ main+ topic+ (substrates,+ nanowire+

polytypism,+ nanowire+ growth+ resumption,+ synchrotron+ radiation+ experiments)+ a+

thesis+chapter+is+dedicated.+In+each+chapter,+an+introduction+explains+the+motivation+

and+interests+of+the+given+topic,+illustrates+the+state+of+the+art+and+demonstrates+our+

strategy+to+the+solution+of+the+open+problems.+Prior+to+the+conclusion,+our+results+are+

presented+and+discussed.+

Have+a+good+reading.+

+

+ +

(10)

+ +

(11)

(

1( ( ( (

(

Introduction( pag( 1(

(

1.1( ( (

(

Nanowire(generalities( pag( 2(

(

1.2( ( (

(

Nanowire(synthesis( pag( 4(

(

1.3( ( (

(

Nanowire(characterization( pag( 4(

2( ( ( (

(

Si@treated(substrates( pag( 5(

(

2.1( ( (

(

Motivation(and(interests( pag( 5(

(

2.2( ( (

(

State( pag( 6(

(

2.3( ( (

(

Our(strategy( pag( 7(

( (

2.3.1(

( (

Epitaxial(substrates( pag( 8(

( (

2.3.2(

( (

Epiready,substrates, pag( 9(

(

2.4( ( (

(

Experimental(results( pag( 10(

( (

2.4.1(

( (

Si

2p

(region( pag( 11(

( (

2.4.2(

( (

As3d(region( pag( 13(

( (

2.4.3(

( (

Ga3d(region( pag( 15(

(

2.5( ( (

(

Discussion( pag( 17(

( (

2.5.1(

( (

Epitaxial(substrates, pag( 17(

( (

2.5.2(

( (

Epiready,substrates, pag( 17(

( (

2.5.3(

( (

Si(thickness( pag( 18(

(

2.6( ( (

(

Effectiveness(of(Si@treated(substrates( pag( 19(

(

2.7( ( (

(

Conclusions( pag( 20(

3( ( ( (

(

GaAs(nanowire(polytypism( pag( 21(

( (

3.0.1(

( (

Introduction( pag( 21(

( (

3.0.2(

( (

Motivation(and(interests( pag( 22(

( (

3.0.3(

( (

Our(strategy( pag( 23(

(

3.1( ( (

(

Influence(of(the(growth(parameters( pag( 24(

( (

3.1.1(

( (

Substrate(material( pag( 24(

( (

3.1.2(

( (

Catalyst(material( pag( 25(

( ( ( ( 3.1.2.1( Vapor(liquid(solid(growth( pag( 26(

( ( ( ( 3.1.2.2( Au@assisted(growth( pag( 28(

( ( ( ( 3.1.2.3( Ga@assisted(growth( pag( 29(

( ( ( ( 3.1.2.4( Summary( pag( 31(

( (

3.1.3(

( (

Role(of(the(material(fluxes( pag( 32(

( ( ( ( 3.1.3.1( Our(strategy( pag( 33(

( (

3.1.4(

( (

Substrate(orientation( pag( 32(

( ( ( ( 3.1.4.1( Droplet@terminated(nanowires( pag( 35(

( ( ( ( 3.1.4.2( Pyramid@terminated(nanowires( pag( 35(

Summary'

State(of(the(Art(

(12)

( ( ( ( 3.1.4.3( Local(fluctuations(of(the(growth(parameters( pag( 35(

( ( ( ( 3.1.4.4( Consequences(on(the(crystal(structure( pag( 37(

( ( ( ( (3.1.4.5( Summary( pag( 39(

( (

3.1.5(

( (

Role(of(the(growth(temperature( pag( 40(

(

3.2( ( (

(

Post(growth(processes( pag( 41(

( (

3.2.1(

( (

Motivation(and(interests( pag( 41(

( (

3.2.2(

( (

State(of(the(art( pag( 42(

( (

3.2.3(

( (

Our(strategy( pag( 43(

( ( ( ( 3.2.3.1( Why(TEM?( pag( 44(

( ( ( ( 3.2.3.2( Why(600(°C?( pag( 44(

( (

3.2.4(

( (

TEM(results( pag( 45(

( ( ( ( 3.2.4.1( First(experiments( pag( 45(

( ( ( ( 3.2.4.2( Similar(ndipendent(experiments( pag( 47(

( ( ( ( 3.2.4.2( Further(experiments( pag( 48(

( (

3.2.5(

( (

Raman( pag( 49(

( ( ( ( 3.2.5.1( Why(Raman?( pag( 49(

( ( ( ( 3.2.5.2( Our(strategy( pag( 50(

( ( ( ( 3.2.5.3( Raman(results( pag( 50(

( ( ( ( 3.2.5.4( Single(nanowire(issues( pag( 51(

( (

3.2.6(

( (

Conclusions( pag( 52(

4( ( ( (

(

GaAs(nanowire(growth(resumption( pag( 53(

(

4.1( ( (

(

Ga(nanoparticle(consumption( pag( 53(

(

4.2( ( (

(

Non@assisted((vapour(solid)(GaAs(nanowire(growth( pag( 56(

( (

4.2.1(

( (

Motivation(and(interests( pag( 56(

( (

4.2.2(

( (

State(of(the(art( pag( 57(

( (

4.2.3(

( (

Our(strategy( pag( 60(

( (

4.2.4(

( (

Discussion( pag( 63(

( (

4.2.5(

( (

Conclusions( pag( 64(

(

4.3( ( (

(

Ga@assisted(GaAs(nanowire(growth(resumption( pag( 65(

( (

4.3.1(

( (

Experimental(results( pag( 65(

( (

4.3.2(

( (

Morphology(result( pag( 66(

( (

4.3.3(

( (

Radial(and(Axial(rowth(rate( pag( 68(

4.3.4( Crystal(structure( pag( 70(

(13)

5( ( ( ( (

Scanning(photoemission(spectroscopy( pag( 81(

(

5.1( ( (

(

Introduction( pag( 81(

(

5.2( ( (

(

Motivation(and(interests( pag( 81(

(

5.3( ( (

(

What(is(SPEM?( pag( 84(

(

5.4( ( (

(

How(is(SPEM(performed?( pag( 85(

(

5.5( ( (

(

Why(SPEM?( pag( 86(

( 5.6( ( (

(

pag( 87(

( ( ( pag(

( ( 5.6.1( ( ( Previous(experiments(on(Au@assistes(GaAs(nanowires( pag( ( 87(

( ( 5.6.2( ( ( Our(Strategy( pag( 88(

( (

5.6.3(

( (

Ga@assisted(nanowires( pag( 88(

( (

5.6.4(

( (

Ga@assisted(versus(Au@assisted(nanowires( pag( 90(

( (

4.6.5(

( (

Effect(of(Si@doping( pag( 92(

(

5.7( ( (

(

Fermi(energy(within(GaAs(band@gap(in(nanowires( pag( 93(

( (

5.7.1(

( (

Axial(junctions( pag( 96(

( (

5.7.2(

( (

Doping(and(growth(mode( pag( 98(

(

5.8( ( (

(

Discussion( pag( 102(

(

5.9( ( (

(

Conclusions( pag( 103(

6( ( ( (

(

Conclusions(and(open(points( pag( 104(

(

6.1( ( (

(

Summary(of(the(results( pag( 104(

(

6.2( ( (

(

Open(points(and(future(research( pag( 105(

Appendix(A( Systematics(of(GaAs(nanowire(growth( pag( 106(

(

A.0( ( (

(

Preface( pag( 106(

(

A.1( ( (

(

Nucleation(stage( pag( 107(

( ( ( A.1.0.1(

(

Motivation(and(interests( pag( 107(

( ( ( A.1.0.2(

(

Si(surfaces( pag( 107(

( ( ( A.1.0.3(

(

GaAs(surfaces( pag( 109(

( ( ( A.1.0.4(

(

Our(strategy( pag( 109(

( (

A.1.1(

( (

Experimental(results( pag( 110(

( ( ( A.1.1.1(

(

XPS( pag( 110(

( ( ( A.1.1.2(

(

GaAs(deposition( pag( 113(

( (

A.1.2(

( (

Conclusions( pag( 114(

(

A.2( ( (

(

Nanowire(systematics(on(Si@treated((100)(substrates( pag( 115(

( (

A.2.0(

( (

Introduction(and(experimental(details( pag( 115(

( (

A.2.1(

( (

Nanowire(growth( pag( 115(

( (

A.2.2(

( (

Growth(rate( pag( 118(

( (

A.2.3(

( (

Epiready,substrates, pag( 120(

((Contactless(conductivity(measurements((

((on(GaAs(nanowires(

(14)

( (

A.2.4(

( (

Comparison(of(epiready(and(epitaxial,substrates( pag( 120(

( (

A.2.5(

( (

Temperature(range( pag( 121(

( (

A.2.6(

( (

Structural(properties( pag( 122(

( (

A.2.7(

( (

Optical(properties( pag( 124(

( (

A.2.8(

( (

Conclusions( pag( 126(

(

A.3( ( (

(

Nanowire(systematics(on(Si@treated((111)B(substrates( pag( 127(

( (

A.3.1(

( (

Introduction( pag( 127(

( (

A.3.2(

( (

Experimental(details( pag( 127(

( (

A.3.3(

( (

Experimental(results( pag( 129(

( ( ( A.3.3.1(

(

Axial(growth(eate( pag( 129(

( ( ( A.3.3.2(

(

Radial(growth(rate( pag( 130(

( ( ( A.3.3.3(

(

Aspect(ratio( pag( 131(

( ( ( A.3.3.4(

(

Structural(properties( pag( 133(

( ( ( A.3.3.5(

(

Optical(properties( pag( 133(

( (

A.3.4(

( (

Conclusions( pag( 133(

Appendix(B( Catalyst(free(Si(nanowires(on(( pag( 134(

( (

B.1( ( (

(

Introduction( pag(

(

( ( (

(

epiready(GaAs((111)B(substrates( pag( 134(

(

B.2( ( (

(

Motivation(and(interests( pag( 134(

(

B.3( ( (

(

State(of(the(art( pag( 135(

(

B.4( ( (

(

Our(strategy( pag( 137(

(

B.5( ( (

(

Experimental(details( pag( 137(

(

B.6( ( (

(

Experimental(results( pag( 137(

( (

B.6.1(

( (

Growth(rate( pag( 138(

( (

B.6.2(

( (

Effect(of(As(flux(on(nanowire(morphology( pag( 139(

(

B.7( ( (

(

Discussion( pag( 140(

(

B.8( ( (

(

Open(points( pag( 141(

(

B.9( ( (

(

Conclusions( pag( 141(

Appendix(C(

( (

Linear(with(time(GaAs(shell(( pag( 142(

(

C.1( ( (

(

Introduction( pag( 142(

(

C.2( ( (

(

Motivation(and(interests( pag( 142(

(

C.3( ( (

(

Our(strategy( pag( 143(

C.4( Experimental(results( pag( 144(

(15)

Appendix(D(

Optical(limiting(as(result(a(of(photoinduced(electron(

transfer(in(( pag( 147(

hybrid(systems(with(CdSe/ZnS(quantum(dots,(C60,(and(

Perylene( pag(

( (

D.1( ( (

(

Introduction( pag( 147(

(

D.2( ( (

(

Motivation(and(interests( pag( 147(

(

D.3( ( (

(

State(of(the(Art( pag( 148(

(

D.4( ( (

(

Our(strategy( pag( 149(

(

D.5( ( (

(

Experimental(details( pag( 150(

(

D.6( ( (

(

Results(and(discussion( pag( 151(

(

D.7( ( (

(

Conclusions( pag( 155(

Appendix(E( Catalyst@embedded(multi@walled(carbon(nanotubes( pag( 156(

(

E.1( ( (

(

Introduction( pag( 156(

(

E.2( ( (

(

Motivation(and(interests( pag( 156(

(

E.3( ( (

(

Experimental(details( pag( 158(

(

E.4( ( (

(

Results( pag( 158(

( (

E.4.1(

( (

Theory(simulation( pag( 159(

( (

E.4.2(

( (

Overview( pag( 161(

( (

E.4.3(

( (

Morphology( pag( 162(

( (

E.4.4(

( (

Chemical(analysis( pag( 163(

( (

E.4.5(

( (

Tilt(series( pag( 164(

( (

E.4.6(

( (

Dark(field(imaging( pag( 165(

(

E.5( ( (

(

Conclusions( pag( 166(

Appendix(F( Experimental(instruments( pag( 167(

(

F.1( ( (

(

Molecular(beam(epitaxy( pag( 167(

( (

F.1.1(

( (

Riber(32P( pag( 168(

( (

F.1.2(

( (

Soviet(MBE(system( pag( 170(

(

F.2( ( (

(

Transmission(electron(microscope( pag( 172(

( (

F.2.1(

( (

Tecnai(G200( pag( 175(

( (

F.2.2(

( (

Libra(200( pag( 175(

( (

F.2.3(

( (

Jeof(2100F( pag( 176(

( ( ( ( ( ( ( (

Bibliography( ( ( ( ( ( ( ( ( (

( (

pag$ $$177$

(16)

((

+

(17)

1.#Introduction#

This! document! has! been! compiled! as! a! Ph.D.! thesis! for! the! Graduate! School! in!

Nanotechnology! located! in! Trieste,! Italy,! under! the! supervision! of! Dr.! Silvia!

Rubini.! The! objective! of! this! research! was! the! growth! and! characterization! of!

nanostructures,!mainly!nanowires.!The!main!interest!was!for!the!Au!free!growth!

of!GaAs!nanowires!by!means!of!molecular!beam!epitaxy.!

At!TASC!IOM!CNR,!in!Basovizza!(TS),!Italy,!the!core!of!the!growth!contribute!to!

my!Ph.D.!took!place!in!collaboration!with!my!supervisor,!dr.!Silvia!Rubini.!

I! spent! four! months! at! Danske! Technische! Universitet! (DTU)! –! Center! for!

Electron!Nanoscopy!(CEN)!and!DTU!Nanotech,!!located!in!Copenhagen,!Denmark.!

At! DTU,! I! worked! with! the! assistance! of! Dr.! Jakob! B.! Wagner,! under! the!

supervision! of! Prof.! Peter! Boggild.! The! objective! of! this! stay! was! the!

familiarization!with!transmission!electron!characterization!of!nanostructures,!in!

particular!GaAs!nanowires.!This!stage!proved!the!Ph.D.!research!to!be!worth!the!

title!of!Doctor!Aeuropeus.!!

A! final! eight! months! research! took! place! at! Saint! Petersburg! (SPB)! Accademic!

University!(AU)!SPB!State!University!(GU),!located!in!Saint!Petersburg,!Russia.!At!

SPBAU! I! focused! on! growing! GaAs! based! nanowires,! both! in! AuQ,! MnQ! and! GaQ!

assisted!experiments!under!the!supervision!of!Prof.!George!E.!Cirlin.!At!SPBGU!I!

mainly! performed! transmission! electron! microscopy! characterization! of! GaAs!

based! nanowires! in! collaboration! with! dr.! Evgenii! A.! Ubyivovk! under! the!

supervision!of!Prof.!Oleg!F.!Vyvenko.!

This! document! is! divided! in! chapters! plus! appendixes.! The! present! chapter!

introduces!my!work!by!explaining!the!physics!involved!in!GaAs!nanowires,!the!

motivation!and!interest!of!my!research!and!the!goals!we!defined!in!the!beginning.!

The!second!chapter!reports!in!detail!on!the!research!of!a!effective!substrate!to!

grow!GaAs!nanowires!in!absence!of!Au.!!!!!!!

The! third! chapter! is! dedicated! to! the! study! of! crystal! polytypism! of! GaAs!

nanowires.! It! has! been! divided! into! the! study! of! the! impact! of! the! growth!

(18)

parameters!on!the!nanowire!crystal!structure,!and!a!second!section!reporting!the!

research!performed!in!Copenhagen,!further!continued!in!Trieste!in!collaboration!

with! dott.! mag.! Damiano! Cassese! and! Dr.! Marco! Lazzarino’s! group! about! the!

possibility!to!modify!the!crystal!structure!after!the!growth.!

The!first!part!of!the!fourth!chapter!has!been!dedicated!to!the!study!of!the!growth!

of! GaAs! nanowires! in! AuQfree! and! GaQfree! mode,! which! is! called! vapourQsolid!

nanowire!growth.!Next,!!the!study!of!the!growth!resumption!in!GaQassisted!mode!

of! GaAs! nanowires! after! the! consumption! of! the! GaQassistant! nanoparticle! is!

analysed.! This! study! has! been! conducted! in! collaboration! with! dott.! mag.!

Giacomo!Priante.!

The! fifth! chapter! comprises! the! results! of! the! experiments! performed! on! GaAs!

nanowires! by! means! of! scanning! photoemission! spectroscopy! at! the! ESCA!

beamline!in!ELETTRA!synchrotron!facility!located!in!Trieste,!Italy.!This!chapter!

is!divided!into!three!sections.!First,!the!properties!of!GaQassisted!GaAs!nanowires!

are! compared! with! those! of! AuQassisted! GaAs! nanowires.! Then,! the!

characterisation! of! the! doping! concentration! by! means! of! the! measurement! of!

the! Fermi! energy! level! position! within! the! band! gap! of! GaAs! in! nanowires! is!

shown.! Finally,! the! consequences! of! the! growth! mode! (GaQassisted! and! non!

assisted)!on!the!dopant!incorporation!are!addressed.!

In! the! final! chapter! a! summary! of! the! results! is! presented.! In! addition,! the!

conclusions! of! the! research! along! with! the! consideration! of! open! areas! for!

further!research!are!underlined.!!

Results!that!could!not!fit!in!the!main!thesis!line!are!put!in!the!appendixes.!Such!

results!concern!growth!systematics,!the!study!of!other!kinds!of!nanostructures,!

as!carbon!nanotubes!or!molecular!systems.!

!

(19)

diameters!can!range!down!to!few!nanometers,!while!nanowire!length!can!easily!

range! to! several! tens! of! microns.! At! such! diameter! values,! quantum! effect!

becomes! important.! ! Therefore,! quantum! confinement! of! the! charge! carriers!

along!the!radial!direction!constitutes!one!of!the!two!most!interesting!properties!

of! nanowires.! Another! attractive! feature! of! nanowires! is! their! high! surfaceQtoQ volume!ratio,!that!allows!a!very!effective!interaction!with!light!and!make!them!

interesting!for!sensing!application.!

Nanowires! can! be! comprised! of! metals! and! semiconductors.! Semiconducting!

nanowires!in!particular!may!allow!the!miniaturization!of!electronic!devices,!and!

in!case!of!IIIQV!semiconductor!nanowires,!of!optoelectronic!devices.!

A!variety!of!different!IIIQV!nanowire!based!optoelectronic!device!prototypes!such!

as!photodetectors,!chemical!and!gas!sensors,!waveguides,!light!emitting!diodes,!

microcavity! lasers,! solar! cells,! and! nonlinear! optical! converters! have! been!

demonstrated.!

[1]

! Moreover,! a! particular! interest! has! been! dedicated! to! the!

growth! of! Au! free! nanowires.! Taking! the! optoelectronic! integration! into!

consideration,! Au! free! GaAs! nanowires! showed! a! greater! internal! quantum!

efficiency!compare!to!Au!assisted!nanowires!of!the!same!material.!

[2]

!

Effective!exploitation!of!IIIQV!based!nanowires!for!optoelectronics!would!occur!

for! structures! free! of! crystal! structure! defects,! which! were! proven! to! be!

detrimental!from!the!technological!point!of!view!

[3]

.!

In!conclusion,!the!synthesis!of!defect!free!and!Au!free!GaAs!nanowires!have!been!

the!main!objectives!of!this!Ph.D.!research.!

!

! !

(20)

1.2#Nanowire#synthesis#

Generally! speaking,! the! methods! to! obtain! nanowires! can! be! divided! into! two!

categories.! First,! topQdown! methods,! where! nanowires! are! fabricated! by!

reducing!the!size!of!pieces!of!material!down!to!the!nanoscale.!Such!processes!are!

brought! about! by! means! of! lithographic! techniques! or! electrophoresis.! Second,!

bottomQup! approaches,! that! exploit! the! selfQaggregation! of! atoms! to! produce!

nanowires.!Such!processes!took!place!by!means!of!suspension,!electrochemical!

deposition,!laser!ablation,!vapour!deposition!and!epitaxy.!

Among!the!other,!molecular!beam!epitaxy!was!the!technique!used!to!synthesize!

nanowires! for! the! present! thesis.! This! technique! will! further! be! discussed! in!!

Appendix!X.!!

1.3#Nanowire#characterization#

Characterization!of!nanostructures!can!be!structural,!morphological,!optical!and!

electrical.! This! thesis! covers! all! these! types! of! characterization.! Structural!

characterization! can! be! performed! by! means! of! XQray! diffraction,! Raman!

Spectroscopy,! transmission! electron! microscopy.! The! latter,! in! particular,! was!

used! during! this! thesis! work.! The! most! efficient! way! to! obtain! morphological!

information! on! the! nanowires! has! been! scanning! electron! microscopy.! Optical!

characterization!was!carried!out!by!means!of!photoluminescence!spectroscopy,!

while! some! electrical! characterization! was! performed! by! means! of! scanning!

photoemission!spectroscopy.!!

! !

(21)

2.#Si:treated#GaAs#substrates#

At!the!beginning!of!this!chapter,!motivations!that!drive!Au!free!nanowire!growth!

research! are! presented;! a! brief! literary! review! of! the! recent! years! interesting!

papers!is!then!given.!In!the!following,!I!will!point!out!the!prerequisites!to!grow!

GaAs! nanowires! on! GaAs! and! then! explain! our! strategy.! The! results! section!

begins! with! the! substrate! characterization! and! finally! their! effectiveness! in!

hosting!Au!free!GaAs!nanowires.!

!

2.1.#Motivation#and#interest#

Although!being!the!most!used!metal!to!assist!MBE!nanowire!growth!

[4]

,!Au!has!

some! drawbacks.! First,! it! was! shown! that! it! can! diffuse! in! nanowires! during!

growth!

[5,! 6]

.! Second,! the! wellQknown! incompatibility! of! Au! with! Si! has! to! be!

considered,!because!of!the!deep!traps!it!creates!in!the!Si!indirect!band!gap!

[7,8]

.!

Third! and! concerning! GaAs,! Au! assisted! nanowires! grow! to! a! temperature! at!

which!the!Ga!diffusion!length!becomes!rapidly!smaller!than!the!nanowire!length.!

This!might!be!a!source!of!unwanted!tapering!

[9,4]

.!

Fourth,!Au!assisted!GaAs!nanowires!present!a!usually!defected!crystal!structure,!

unless!special!attention!is!paid!to!the!growth!protocol!

[10]

.!

There! are! alternatives! to! Au.! Concerning! GaAs,! such! alternatives! employ! Ga! as!

metal! trigger! to! drive! the! nanowire! growth.! In! this! case,! nanowires! present!

strong! pros! in! all! the! quoted! cons! of! Au.! We! reported! a! good! example! of! Ga!

assisted!MBE!nanowires!properties!

[11]

.

!

GaQassisted!GaAs!nanowires!by!MBE!are!almost!untapered,!have!a!close!to!phaseQ purity! crystal! structure,! grow! in! a! wide! temperature! range! and! have! excellent!

optical!properties.!

The! biggest! drawback! of! this! approach,! addressed! in! this! thesis! but! almost!

neglected! in! literature,! are! the! difficulty! to! control! nanowire! diameter! and!

density.!

(22)

2.2.#State#of#the#art#

Successful!examples!of!Au!free!MBE!GaAs!nanowire!growth!were!reported!on!Si!

[12Q16]!

and! on! GaAs!

[17Q19]

.! In! most! cases!

[12Q15]!

authors! reported! the! presence! of!

native!oxides!on!the!silicon!substrate!surface!prior!to!nanowire!growth.!The!Si!

oxide! alters! the! adatom! diffusivity! on! the! surface! as! well! as! the! nucleation!

density.!Clean!Si!surfaces!hosted,!for!the!same!temperature,!a!greater!density!of!

NWs!as!compared!to!the!oxidized!Si!

[16]

.!In!the!same!paper!it!was!shown!that!the!

growth!temperature!range!for!the!best!NW!yield!was!also!different!on!the!two!

surfaces.!Clean!Si!surface!did!not!host!nanowires!at!660!°C!or!above.!

No!direct!GaAs!nanowire!growth!on!GaAs!has!been!reported!due!to!the!lack!of!

nucleation!sites!for!selective,!anisothropic!crystal!growth!as!opposed!to!layerQbyQ layer!twoQdimensional!growth!

[20]

.!Such!a!selectivity!has!been!shown!to!be!given!

for!instance!by!the!presence!of!a!thin!Si!oxide!layer!on!the!surface,!which!has!a!

lower! sticking! coefficient! than! the! underlying! GaAs!

[17]

.! .In! principle,! other! SiQ based! compound! masks! could! be! as! effective.! Possible! substitutes! to! SiO

x

! are!

Si

3

N

x

! and! SiH

x

.! The! X! chemical! pedices! indicates! the! possible! presence! of! Si!

suboxides!different!from!Si

4+![11]

.!!

In!the!years!immediately!following!the!present!research!work!though,!nanowire!

growth!on!clean!Si!surface!was!demonstrated,!so!the!interest!in!changing!SiO

x

!as!

mask! material! lost! importance! and! was! then! abandoned.! Furthermore,! no!

detailed!study!of!the!Ga!sticking!coefficient!on!Si!compounds!was!ever!available!

in!literature.!

GaAs!nanowire!growth!was!reported!on!GaAs!substrates!coated!with!a!sputtered!

SiO

2

! layer! 6! to! 30! nm! in! thickness! and! dipped! in! HF! aqueous! solution! before!

being!loaded!in!the!MBE!system.!

[17Q19]

.

!

It!was!shown!how!a!too!thick!Si!oxide!layer!prevented!the!establishment!of!an!

(23)

clear.!It!was!proposed!that!SiO

x

!become!mobile!above!530!°C!

[14,!19,!21]

.!!

It!was!observed!that!such!a!high!temperature!led!to!the!opening!of!small!craters!

in!the!SiO

x

!adlayer!on!InAs!

[22]

,! where!the!indium!adatoms!would!coalesce!and!

give! rise! to! the! Au! free! NW! growth,! in! a! In! assisted! vapour! liquidQsolidQ mechanism.! The! actual! coalescence! of! In! nanoparticles! and! their! catalyst! role!

was! though! debated! because! of! the! absence! of! In! droplets! at! the! Au! free! InAs!

nanowires!at!the!end!of!the!growth

[23Q24]

.!

!

It! will! be! shown! in! the! following! that! for! GaAs,! the! NW! density! is! almost!

insensible! to! any! annealing! procedure! prior! to! the! NW! growth.! The! nanowire!

density! increases! with! increasing! growth! temperature,! up! to! the! GaAs!

evaporation! temperature,! above! which! the! density! abruptly! falls! to! zero.!

Although! we! cannot! rule! out! a! temperature! dependent! nucleation! step,! we!

proved! that! temperature! annealing! by! itself! is! not! able! to! enhance! the! GaAs!

nanowire!density!on!GaAs.!

!

!

2.3.#Our#strategy#

We! wanted! to! minimize! the! substrate! surface! treatment! to! achieve! Au! free!

nanowire!growth.!The!goal!was!to!obtain!a!surfaceQenergy!modulated!substrate,!

where! the! vaporQtoQsolid! reaction! activation! energy! would! be! lowered! by! the!

coalescence!of!Ga!nanoparticles.!

Our! road! to! the! growth! of! GaAs! nanowires! on! GaAs! did! not! employ! any!

sputtering! nor! chemical! etching,! nor! other! mechanical! or! chemical! processes.!

The! necessary! few! monolayer! thick! oxidized! silicon! layer! was! obtained! in! two!

methods:! epitaxial! deposition! of! Si! on! thermally! deoxidized! GaAs! wafers,!

followed!by!atmospheric!oxidation!(epitaxial!substrates),!or!epitaxial!deposition!

of!Si!on!epiready!(oxidized)!GaAs!wafers!(epiready!substrates).!The!last!method!

in!particular!showed!the!possibility!to!achieve!GaAs!nanowire!growth!totally!in, situ,,directly!on!commercially!available!GaAs!wafers,!and!therefore!proved!to!be!

the!simplest!way!ever,!to!grow!GaAs!nanowires!on!GaAs.!

The! key! points! of! our! preparation! method! were! two:! the! thickness! of! the!

(24)

deposited! Si! layer! and! the! oxidation! time! (not! available! into! account! in! the!

second! approach! of! ours).! The! Si! oxide! thickness! was! shown! to! be! crucial! to!

achieve!epitaxial!nanowire!growth!

[17Q18]

,!because!a!too!thick!adlayer!resulted!in!

loss!of!epitaxial!relation!between!nanowires!and!substrate.!On!the!contrary!GaAs!

deposition!on!clean!Si!(SiO

x

!thickness!=!0)!led!to!epitaxial!2D!growth!as!opposed!

to! 1D! anisothropic! nanowire! growth!

[25]

.! Unfortunately! neither! of! these! two!

points! have! been! yet! completely! rationalized! and! only! empirical!

phenomenological!indications!can!be!given.!!

We!found!that!the!oxidation!time!seemed!to!be!more!or!less!non!influent!up!to!

one!week!after!the!substrate!preparation,!i.e.!growth!experiments!performed!on!

substrates! up! to! one! week! old! led! to! comparable! results! in! terms! of! nanowire!

density!and!length.!On!purpose!of!the!quantity!of!Si!deposited!on!the!wafers,!we!

found!a!small!range!of!thickness!values,!for!which!the!growth!experiments!led!to!

a! satisfactory! nanowire! yield.! Outside! such! extremes,! the! nanowire! density!

dropped,!very!likely!due!to!a!surface!chemical!environment!not!suitable!for!the!

nanowire!growth!process!to!take!place.!!

XQray! photoemission! spectroscopy! was! widely! used,! to! understand! what! were!

the! surfaces! that! led! to! dense! nanowire! population! and! what! were! not.!

Investigated!core!levels!were!(Ga

3p

!,!Si

2p

,!,!Ga

3d

!as!well!as!!As

3d

)!

!

! !

(25)

2.3.1.#Epitaxial(substrates#

Epitaxial,substrates!were!prepared!as!following.!nQtype!GaAs!(001)!wafers!(Si!

doped,!N

D

=!1x10

16

!cm

Q3

)!were!outgassed!at!300!°C!in!a!buffer!modulus!before!

their!introduction!in!the!MBE!growth!chamber.!Substrates!were!then!thermally!

deoxidized!at!580!°C.!A!0,3QµmQthickQbuffer!GaAs!layer!was!then!grown!at!600!°C!

at!a!growth!rate!of!1!µm/h,!with!a!Ga!to!As!equivalent!beam!pressure!ratio!of!10!

to!12,!as!determined!by!means!of!an!ion!gauge!positioned!at!the!sample!location.!

After!the!GaAs!buffer!growth,!the!sample!temperature!was!lowered!to!500°C.!4!

monolayers!Si!were!then!deposited!(1!Si!monolayer!=!6.26!x!10

14

!cm

Q2

)!under!As!

flux!at!a!rate!of!0.02!ML/s.!The!Si!growth!rate!was!calibrated!in!the!previous!(not!

shown).!These!growth!conditions!are!consistent!with!those!used!to!obtain!high!

quality!Si/GaAs!superlattices!

[25]

.!!

The! substrates! were! then! exposed! to! air! for! 15! min! at! 300! °C! on! a! hot! plate!

located! in! the! clenroom,! before! being! introduced! again! in! the! UHV! system! and!

degassed!at!300°C!for!30!minutes.!

,

2.3.2#Epiready(substrates#

Epiready, substrates! were! prepared! as! follows.! Epiready! GaAs! substrates! as!

received!by!the!supplier!

[26]!

were!just!degassed!in!UHV!at!300!°C!for!30!min!prior!

to!the!deposition!of!a!Si!layer!in!the!same!conditions!reported!above!for!epitaxial!

substrates.!XPS!analysis!of!the!substrates!after!different!Si!deposition!times!(not!

shown)!revealed!that!the!Si!equivalent!thickness!obtained!on!the!epiready!GaAs!

susbtrates! was! reduced! by! a! factor! of! 2,! as! compared! to! the! epitaxial! case! for!

similar! deposition! times.! In! other! words,! the! same! deposition! time! gave! on!

epiready! substrates! half! the! thickness! they! would! give! on! epitaxial, substrates.!

We!interpreted!this!result!invoking!a!lower!sticking!coefficient!of!Si!adatoms!on!

oxidized! GaAs! as! compared! to! the! epitaxial! surface.! In! the! following,! we! quote!

the!Si!equivalent!thickness!(in!MLs)!as!estimated!from!XPS.! !

(26)

2.4#Experimental#Results#

What! follows! is! to! be! considered! representative! of! all,measured! substrates.! In!!

table!1,!the!relevant!binding!energy!values,!referred!to!the!spectrometer!Fermi!

level,!are!summarized.!

!

!

!

Core!

Electron!

Peak!

Binding!Energy! SpinQorbit!

splitting! Fitting!Procedure!

As

3d

! ≈!41!eV! 0.71!eV! 2!Voigt!curves!

Ga

3p

! 104Q108!eV! 2.45!eV! 2!Voigt!curves!

Ga

3d

! ≈!20!eV! 0.43!eV! 1!Voigt!curve!

Si

2p

! ≈!100!eV! 0.6!eV! 1!Voigt!curve!

#

Table#2.1:#Core#electron#peak#data#that#appear#in#the#upcoming#analysis#

!

!

! !

(27)

2.4.1.#Si

2p

#region#

In!fig.!2.1,!the!binding!energy!region!from!99!to!114!eV,!as!recorded!on!our!SiQ treated!substrates,!is!shown.!

!

!

Figure#2.1:#Ga#3p#and#Si#2p#core#level#photoemission#recorded#on#different#substrates.#(a)#Epitaxial#substrates#

with#4#MLs#of#Si#as#grown#and#(b)#after#expo:#sure#to#air.#(c)#Epiready#GaAs#(001)#wafers#as#received#from#the#

supplier#and#(d)#after#deposition#of#4#MLs#of#Si.#

(28)

In!fig.!2.1,!the!binding!energy!region!from!99!to!114!eV,!as!recorded!on!our!SiQ treated! substrates,! is! shown.! The! first! two! rows! (curves! aQb)! refer! to! epitaxial, substrates,! where! 4! Si! monolayers! were! deposited.! In! curve! (a)! the! Ga

3d

! spin!

orbit!doublet!and!the!Si

2p

!core!electron!peak!are!clearly!separated,!identified!and!

fitted.!Curve!(b)!is!taken!after!exposure!to!the!air.!We!see!that!the!lowest!energy!

peak,!correspondent!to!the!Si

2p

!electron!emission!shifts!towards!higher!binding!

energies! and! merges! with! the! Ga

3d3/2

! peak.! This! is! a! distinctive! sign! of! the!

atmoshperic!oxidation!process.!

Similarly,!curve!(c)!shows!the!surface!of!epiready!GaAs!(100)!wafers!as!received!

from! the! supplier.! Electron! peaks! are! slightly! larger! than! their! thermally!

deoxidized!correspondent!in!(a).!Curve!(d)!shows!the!same!surface!after!the!Si!

deposition:!again,!a!new!peak!appear,!merged!with!Ga

3d3/2

!but!the!peak!of!native!

Si!does!not!completely!disappear,!as!in!the!case!of!epitaxial,substrates.!

#

!

! !

(29)

2.4.2.#As

3d

#region#

In! fig.! 2.2,! the! binding! energy! region! from! 38! to! 47! eV,! as! recorded! on! our! SiQ treated!substrates,!is!shown.!

!

Figure#2.2:#As#3d#core#level#photoemission#recorded#on#different#substrates.#(a)#Epitaxial#substrate#with#4#MLs#of#

Si# as# grown# and# (b)# after# exposure# to# air.# (c)# Epiready# GaAs# as# received# from# the# supplier# and# (d)# epiready#

substrate#after#deposition#of#4#MLs#of#Si.#

(30)

Fig.!2.2!shows!the!correspondent!changes!in!the!As

3d

!core!electron!peaks,!upon!

oxidation! of! the! surface.! in! (a)Q(b)! the! epitaxial, surface! is! shown:! no! change!

occurs!in!the!As

3d

!lineshape!(except!a!hardly!detectable!small!contribution!4.2!eV!

higher! in! binding! energy! than! the! As

3d

! spin! orbit! doublet,! compatible! with! the!

As

5+

!oxidation!state.!In!(c)Q(d)!the!epiready!surface!is!shown:!(c)!shows!both!the!

As

3+

!and!As

5+

!oxidation!states,!while!in!(d)!the!reduction!by!Si!is!total!and!only!

the!native!As!3d!spin!orbit!doublet!is!visible.!

! !

(31)

2.4.3.#Ga

3d

#region#

In! fig.! 2.3,! the! binding! energy! region! from! 17! to! 25! eV,! as! recorded! on! our! SiQ treated!substrates,!is!shown.!

!

Figure#2.3:#Ga3d#core#level#photoemission#recorded#on#different#substrates.#(a)#Epitaxial#substrate#with#4#MLs#of#

Si#as#grown#and#(b)#after#exposure#to#air.#(c)#Epiready#GaAs#as#received#from#the#supplier#and#(d)#after#deposition#

of#4#MLs#of#Si.#

! !

(32)

Fig.!2.3!shows!the!same!four!cases!for!the!Ga!3d!core!electron!peak.!As!for!the!

previous!case,!curve!(a)!shows!a!pristine!surface!while!in!curve!(b)!a!small!oxide!

contribution!is!visible!(Ga

1+

!oxidation!state);!curve!(c)!shows!on!the!contrary!a!

fully!oxidized!surface!(both!Ga

1+

!and

3+

!oxide!levels!are!visible!on!the!left!side!of!

the!native!Ga

3d

!electron!peak)!while!curve!(d)!shows!a!much!reduced!lineshape,!

with!less!Ga

1+

!and!almost!no!Ga

3+

!states.!

! !

(33)

2.5.#Discussion#

The!effect!of!the!deposition!of!4!ML!Si!on!GaAs!substrates!is!shown!in!fig.s!2.1Q2.!

A!comparative!discussion!is!hereby!presented.!

!

2.5.1.(Epitaxial(substrates(

On!thermally!deoxidized!GaAs,!Si!deposition!resulted!in!a!clean!a!Si!layer!until!it!

got!oxidized!by!air!exposure.!In!this!case,!Si!oxide!is!found!on!the!surface!while!

the!underlying!GaAs!remains!pristine.!The!small!oxide!contribution!visible!in!in!

fig.!2.2(b)!can!be!explained!simply!by!the!atmospheric!oxidation!of!few!As!atoms!

segregated!on!the!Si!surface!during!its!deposition!in!As!flux.!!

By! analyzing! the! chemical! shift! of! the! oxidized! silicon! peak! in! 1(b)! from! 1(a),!

corresponding! to! 2.9! eV,! we! evaluated! the! oxidized! surface! to! host! the! Si

3+

! suboxide!state!

[27]

.!

,

2.5.2.#Epiready#substrates#

On! epiready! GaAs! substrates,! Si! deposition! resulted! in! a! chemical! reduction! of!

the! GaAs! surface.! Concomitantly,! the! Si! oxidizeed;! after! the! reaction,! the! GaAs!

surface!was!only!slightly!oxidized,!while!a!part!of!the!deposited!4!Si!monolayers!

did!not!react.!GaAs!reduction!by!means!of!Si!at!room!temperature!was!already!

shown!to!be!effective!

[28]

.

! !

The!presence!of!both!the!oxidized!and!unreacted!Si!allowed!the!direct!evaluation!

of!the!chemical!shift,!which!is!found!to!be!2.27!eV,!close!to!the!Si

4+

!oxidation!state.!

[27]

!

Although!the!oxidation!reaction!is!not!quantitative!nor!presents!a!single!product,!

such! a! procedure! was! shown! not! to! have! any! consequences! on! the! GaAs!

nanowire!yield.!

[11]

!

! !

(34)

2.5.3.#Si#thickness#

Outside! the! investigated! values,! i.e.! for! θ

Si

! <! 3! ML! or! θ

Si

! >! 8! ML,! the! density!

showed!a!clear,!but!not!easyQtoQunderstand!behavior.!In!particular,!in!case!of!too!

thin!Si!layer,!the!oxidation!step!resulted!in!the!oxidation!of!the!underlying!GaAs!

(not! shown).! In! this! case,! the! nanowire! density! dropped! abruptly! to! 0.! On! the!

contrary,!increasing!the!Si!thickness!reduced!the!NW!density,!up!to!a!nonQsharp!

value! close! to! 8! ML! Si.! Unfortunately,! given! the! empirical! approach! offered! by!

this!method,!no!quantitative!information!can!be!given!(both!the!epitaxial,and!the!

epiready!substrates!employed!a!non!quantitative!controlled!oxidation!agent)!and!

only! qualitative! estimation! together! with! trialQandQerror! method! proved! to! be!

useful.! Reduced! nanowire! density! was! for! instance! required! in! case! of! SPEM!

experiments,! or! to! investigate! the! nanowire! morphology! in! detail! by! scanning!

electron!microscopy.!

!

! !

(35)

2.6.#Effectiveness#of#Si:treated#substrates#

In! figure! tempi_corti_confronto! is! visible! that! a! 3! minutes! long! material!

deposition!results!in!nanowire!growth.!The!substrate!was!SiQtreated!substrates!

with! 4! monolayers! Si.! The! substrate! was! prepared! in! the! epiready! approach.!

Equivalent!results!were!found!by!means!of!the!epitaxial!approach!(see!appendix).!

I! particularly! show! epiready! samples! because! of! their! greater! simplicity! of!

preparation.!

!

Figure# 2.4:# an# ensembe# of# SEM# micrographs# of# a# nanowire# growth# experiment# performed# on# (100)# Si:treated#

GaAs#substrates#with#4#equivalent#monolayers#Si#in#panels#(a:c)#and#on#(111)B#Si:treated#substrates#in#panels#(b:

d).#

Fig.! 2.4!shows!the!result!of!the!Ga!and!As!material!deposition!on!the!SiQtreated!

GaAs! substrates! as! described! in! the! previous.! The! growth! experiment! was!

(36)

performed! for! 3! minutes,! with! an! As! to! Ga! beam! equivalent! pressure! ratio! of!!

10Q12! at! 620! °C.! GaAs! nanowires! were! obtained.! In! panels! (a)Q(b)! a! SEM!

overview!of!the!nanowire!population!on!SiQtreated!GaAs!(111)B!(panel!(a))!and!

SiQtreated!GaAs!(100)!in!panel!(b).!Panel!(a)!is!imaged!at!45°!with!respect!to!the!

substrate! normal.! On! both! substrates,! epitaxially! ordered! GaAs! nanowires! are!

present!on!the!substrate,!together!with!some!other!structures!which!do!not!have!

the!nanowire!aspect!ratio.!We!notice!the!brighter!contrast!of!the!nanowires!with!

respect!to!the!background.!In!panels!(c)Q(d)!a!higher!magnification!details!of!the!

nanowires,!where!the!morphology!of!the!single!wires!is!appreciable.!We!notice!

the!presence!of!a!nanoparticle!at!the!nanowire!free!end!both!on!SiQtreated!GaAs!

(111)B!substrates!(panel!(c))!and!on!SiQtreated!GaAs!(100)!(panel!(d)).!

!

2.7.!Conclusions!

This!result!confirmed!the!effectiveness!of!the!SiQtreated!GaAs!substrate!to!host!

Au! free! GaAs! nanowires! by! molecular! beam! epitaxy.! In! particular! a! sub!

nanometric!thick!Si!adlayer!on!epiready!GaAs!(111)B!and!(100)!substrates!gave!

rise!to!epitaxially!oriented!nanowires!with!a!nanoparticle!at!their!free!end.!Other!

structures!which!do!not!have!the!nanowire!aspect!ratio!are!visible!as!well.!

! !

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